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Sputtering

sputtering

Sputtering technology finds application in precision optics, today and in the ophthalmic optics.
In sputtering the cathode to the Targent thereon at high voltage is placed. The positive gas ions are accelerated towards the negative cathode and knock out the target particles which I condense on the substrate.
It is the sputtering method, therefore, not a thermal process, but an atomic collision process. The Atomic sputtered of the target hit with a 10 times higher energy than the substrates in a vapor deposition process.
behind the cathode plate on which the target is a permanent magnet is applied. The substrate holders are automatically run after loading into the lock chamber, which is then pumped out, then the valve opens to the coating chamber and after the inlet of argon (Ar) and the reaction gas, oxygen, or nitrogen, the coating begins.

Prepared by Isabel R.